Ni and NiCr Sputtering Targets and Evaporable Cathodes

Ni and NiCr Sputtering Targets and Evaporable Cathodes

01
Description
Nickel sputtering targets and evaporable cathodes are used for vacuum sputtering and deposition of thin films in electronics and electrical engineering.
02
specifications
Nickel sputtering targets (electrodes) under Ni1-PM brand name


Products are made under Ni1-PM brand name. If requested by the customer, products under NiP1 and NiP2 brand names can be made according to GOST 492-2006. The ensured purity of the material is Ni 99.9% min with a minimum content of harmful impurities.

Products are made by powder metallurgy methods. The density of deformed (hot-rolled, forged) products is 99% min of the theoretical density. The material structure of nickel sputtering targets and evaporable cathodes does not contain internally bound pores or open porosity.



NiCr sputtering targets



Brand name is Cr20Ni80 99.9-PM.

Total of metal impurities in Cr20Ni80 99.9-PM is 1000 ppm max.
03
advantages
Sufficiently high chemical purity
High density and uniform microstructure of the material, ensuring stability of the target sputtering or arc evaporation process
Strict quality control of all produced materials
In-house research laboratory
04
Product names
Examples of brand names:       

  • Ni1-PM;
  • Cr20Ni80 99,9-PM



You can contact our sales managers for more details at:

export_polema@metholding.com,

tel.: +7(4872)25-06-76.
05
chemical composition
Ensured chemical composition of Ni1-PM products: 

Name

Ni C Fe Co Si Cu Mg As S Zn P Cd Bi Mn Sn Pb Sb Ca
ppm, max
Ni1-PM 99.9%
min
0.09%
max
15 10 10 3 3 5 7 3 3 1 1 3 1 1 2 50

Chemical composition of Cr20Ni80 99.9-PM

Name

Ni+Cr,
%,
min
Cr, % Impurities, ppm, max
Fe Al Si Cu Ca Mn S C O N
Cr20Ni80 99.9-МП 99.9 20±1.5 500 100 100 50 50 200 100 200 500 100
06
miscellaneous
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07
Application areas
Aerospace Engineering
Nucler Power Engineering
Wear-Resistant, Corrosion-Resistant, and Decorative Coatings