Tungsten Sheets, Plates and Sputtering Targets
Tungsten, due to its high absorption of X-rays and gamma rays, is widely used as shields to attenuate the flow of radioactive radiation in nuclear power industry, collimators, and radiotherapy.
Sputtering tungsten targets, shaped as plates, are used for deposition of thin barrier films in the process of semiconductor components' metallization in integrated circuits.
Sheets are made from tungsten powder PW1, PW2, reduced by hydrogen from tungsten oxide. Tungsten oxide with a mass fraction of WO3 99.98% is used as a raw material (typical values are 99.99% WO3, excluding gas-forming elements).
Sheets and plates are manufactured with thickness of 0.5 - 45 mm, with shears-cut sides or machined as agreed with the customer.
The roughness of the machined surfaces is set to Ra <10 μm.
|
Thickness, mm |
Width, mm | Length, mm |
| 0.5 - 0.7 | 20 - 250 | 50 - 1000 |
| > 0.7 - 5 | 30 - 310 | 50 - 1000 |
| > 5 - 7 | 30 - 320 | 50 - 700 |
| > 7 - 15 | 30 - 305 | 50 - 350 |
| > 15 - 20 | 30 - 250 | 100 - 300 |
| > 20 - 45 | 150 max* | 250 max* |
*Width and length are set related to the target's thickness.
Tungsten plates and sheets can be made with other maximum dimensions in width, length and thickness, for example, 0.3 mm min thick, as agreed with customers.
Non-flatness of
-- thin sheets up to 3 mm thick: < 2 mm per 100 mm of length;
-- sheets over 3 mm thick without machining: < 1 mm per 100 mm of length.
If required by the customer, tungsten sheet can be made with increased requirements for non-flatness.
As agreed with the customer, sheets and plates are supplied with controlled micro- and macrostructure, mechanical properties, and density.
High-Precision Tungsten Rolled Sheet Product
The chemical composition and dimensions of tungsten rolled product are subject to requirements that comply with ASTM B760 and are characterized with higher surface quality requirements if compared to GOST 23922 for tungsten sheets.
Dimensions and surface condition
|
Thickness, mm |
Thickness tolerance, % max | Width, mm | Length, mm |
| 0.5 - 1 | ± 10 | 10 - 200 | 50 - 1000 |
| > 1 - 15 | ± 10 | 10 - 310 | 50 - 1000 |
| > 15 - 40 | ± 10 | 10 - 310 | 50 - 600 |
Max deviations in width, length, non-flatness of rolled products
Thin sheet 0.5 - 4.75 mm thick is manufactured with with shears-cut edges with a width tolerance of ± 1.6 mm or machined side surfaces with a width tolerance of ± 0.8 mm, unless otherwise specified by the customer.
The maximum deviations in the length of rolled products do not exceed ± 1.6 mm per 304.8 mm of length, and the sickle shape is 1.6 mm max per 304.8 mm of length, unless other tolerances are specified by the customer.
Deviations from flatness (waviness) depend on the thickness of the rolled products.
|
Thickness, mm |
Deviation from flatness, %, max |
| 0.5 - 4,75 | 4 |
| > 4.75 - 15.9 | 5 |
Surface roughness of machined rolled products.
The roughness parameter of the milled surface is Rz 40 max.
The roughness parameter of the ground surface is Ra 1.6 max.
Heat treatment
Pressure-treated rolled products are annealed to relieve internal stress, unless the customer has specified other requirements for the material condition.
Thicker plates are made from the same reduced tungsten powder as thin rolled products (see above).
The mass fraction of tungsten is calculated by deducting the sum of controlled metal impurities from 100%, excluding the gas-forming elements C, O, N, S, H, F, and Cl.
Here is an example of the chemical composition of such rolled products: 3.5 mm sheet
|
Name |
W, % |
Impurities, ppm* | |||||||||||||
| C | O | N | Fe | Al | Ni | Si | Ca | Na | K | Mo | P | S | As | ||
| Tungsten 99.95 | 99.986 | 15 | 40 | 20 | 13 | 2 | 15 | 6 | 6 | 6 | 20 | 45 | <1 | 10 | 1 |
* The total content of metal impurities as measured by inductively coupled plasma mass spectrometry ICP-MS is 0.0138% (138 μg/g) max.
Tungsten Sputtering Targets
Tungsten sputtering targets are produced as machined plates and discs with dimensions and surface conditions specified in the product drawings agreed with the customer.
The mass fraction of tungsten is determined by deducting the sum of controlled metal impurities from 100%, excluding the gas-forming elements C, O, N, S, H, F, and Cl.
Metal impurities are measured using inductively coupled plasma mass spectrometry (ICP-MS).
Sputtering tungsten targets are manufactured in the form of machined plates and discs with dimensions and surface conditions specified in the product drawing as agreed with the customer.
You can contact our sales managers for more details at:
export_polema@metholding.com,
tel.: +7(4872)25-06-76.
|
Name |
W,% min* |
Impurities, ppm, max | ||||||
| Fe | Al | Ni | Si | C | O | N | ||
| Tungsten 99.95-PM | 99.95 | 80 | 50 | 50 | 50 | 100 | 100 | 100 |
| ∑ metal impurities < 500 ** | ||||||||
Example of rolled tungsten sheet chemical composition (3.5mmt)
|
Name |
W, % | Impurities, ppm* | |||||||||||||
| C | O | N | Fe | Al | Ni | Si | Ca | Na | K | Mo | P | S | As | ||
| Tungsten 99.95-PM | 99.986 | 15 | 40 | 20 | 13 | 2 | 15 | 6 | 6 | 6 | 20 | 45 | <1 | 10 | 1 |
Ensured chemical composition of rolled tungsten products
| Name | W, % min* | Impurities, ppm, max | ||||||
| Fe | Al | Ni | Si | C | O | N | ||
| Tungsten 99.95-PM | 99.95 | 80 | 50 | 50 | 50 | 50 | 100 | 100 |
Example of tungsten powder chemical composition used for tungsten item production
|
Name |
W, % | Impurities, ppm | |||||||||||
| Na | Al | Si | P | K | Ca | Ti | V | Fe | Ni | Mo | ∑As, Cd, Sn, Sb, Pb, Bi | ||
| PW1 | >99.98 | 6 | 7 | < 5 | 10 | 10 | 6 | 0,6 | 0,3 | 15 | 12 | 38 | < 9,5 |
| ∑ impurities, excl. C, N, O, H, F, P, S, Cl < 122 | |||||||||||||
| PW2 | >99.98 | 0.5 | 1 | 6 | 6 | 50 | 10 | 0,1 | 2 | 10 | 5 | 55 | < 3 |
| ∑impurities, excl. C, N, O, H, F, P, S, Cl < 160 | |||||||||||||
At the customer's request, tungsten sheets can be manufactured with tighter non-flatness requirements.
As agreed with the customer sheets and plates are supplied with controlled micro- and macrostructure, mechanical properties, and density.